The standard silicon on isolator (SOI) wafer has suffered from low thermal conductivity and, as result, from bad power performance. There are 2 reasons: low thermal conductivity of BOX(10W/K*m) and low thermal conductivity of host Silicon wafer (130W/K*m). If to change the BOX and Si by 3C-SiC (480 W/K*m) the power performance of Si devices will be improved in 3 times and leakage current reduced by 50%. New Si on SiC (SiSiC) wafer will be compatible with regular Si wafer processing.
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ABOUT THE ENTRANT
- Name:Joseph Kaplun
- Type of entry:individual
- Profession:
- Number of times previously entering contest:3
- Patent status:none